Introduction to FLOSFIA Inc.'s "Mist CVD Method Technology"
Film-forming reaction technology particularly using "water" among liquids!
The "Mist CVD method" is a technology that uses a liquid "mist" that can be treated like a gas to perform a film-forming reaction (CVD). By using a mist-like raw material solution and a heating section, it is possible to produce oxide semiconductor thin films easily, inexpensively, and safely. This technology is suitable for forming many crystalline oxide films, and by applying it, it can be utilized in various applications and industrial fields such as solar cells, fuel cells, and organic devices. 【Features】 ■ Made from liquids, especially water ■ Raw materials can be supplied to the film-forming chamber in mist form ■ High safety of raw materials ■ No vacuum pump required ■ Large area, low cost, compact size, and high throughput are achievable *For more details, please refer to the catalog or feel free to contact us.
- Company：FLOSFIA
- Price：Other
